水洗塔
 相关产品    废气/排风    配件
一. 构造与原理:
1.当欲处理之气体进入塔内时,由于填充物(拉西环),造成的面积相当大,经循环泵浦由喷嘴所洒下之液体,与填充物充份雾化并和废气行气液雾化逆流之充分洗涤。填充塔内之除水层,所填充之滤料能将气流带出之水滴去除,再将气体排入大气中。

二. 配套设备:
1.加药机:以ph meter为sensor自动加药,随调整水洗塔内部水质。
2.废水处理池:水洗塔内溢流出的水因与酸碱及其它成份之气体接触,故排放前须先进入废水池处理才能合于标准(曝气、沈降、加药)

三. 用途:
1. 适用于印刷电路板工厂、电镀厂、化工厂、钢铁厂、金属表面处理业、……等废气之处理。污染源为HCL,HF,SO ,NO ,NH ,CrO ,HCHO,HCN,H S,PCL ,H SO ,Br ,(CH ) N,CL 等特定化学物质之废气处理。

备注:
    废气中若有粉尘或黏滞性物质一并吸入时,须先过滤后才能将气体导入水洗塔内,否则将较易造成水洗设备的喷嘴阻塞。
污染物
Contaminants
污染物状态
Type
Yuh Cherng
%efficiency
Yuh Cherng
%efficiency
Acetic Acid(CH3O2H)乙酸 G & L 98%-99% 85%-95%
Acetone(CH3HCH3)丙酮 G 98%-99% 85%-95%
Aluminum Bright Dip 铝烟 G & L 40%-98% 30%-90%
Aluminum Chlorde(AlCl3)氯化铝 S 99% 90%-95%
2Amines(RNH2)有机氧 G 98%-99% 85%-95%
2Ammonia(NH3)氨氧 G 97%-99% 80%-95%
Ammonium Hydroxide(NH4OH)氨水 L 97%-99% 80%-95%
Ammonium Nitrate(NH4NO3)硝酸铵 S & SS 98%-99% 85%-95%
Anodizing Solutions 电镀液 L 99% 98%-99%
Boric Acid(H3BO3)硼酸 L 95%-98% 80%-90%
1Bromine(Br2)溴 G 99% 90%-95%
1Carbon Dioxide(CO2)二氧化碳 G 70%-85% 40%-50%
Caustic(NaOH)氢氧化钠 L 99% 98%-99%
1Chlorine(Cl2)氯 G 99% 90%-95%
Chlorosulfonic Acid(ClSO2OH)氯磺酸 S 99% 90%-95%
3Chlorine Dioxide(ClO2)二氧化氯 G 95%-98% 85%-95%
Chromic Acid(H2CrO4)铬酸 L 99% 97%-99%
Citric Acid 柠檬酸 L 98%-99% 85%-95%
Cyanide Salts L 99% 98%-99%
Ethanol(CH3CH2OH)乙醇 G & L 99% 90%-95%
1Formaldehyde(HCHO)甲醛 G & L 98%-99% 85%-95%
Formic Acid(HCO2H)甲酸 G 98%-99% 85%-95%
Hydrobromic Acid(Hbr)溴化氢 G & L 98%-99% 85%-95%
Hydrochloric Acid(Hcl)盐酸 G,L & SL 98%-99% 85%-95%
2Hydrofluoric Acid(HF)氟化氢 G 99% 90%-95%
Hydrogen Cyanide(HCN)氰气(酸) G 99% 90%-95%
3Mercaptans(RSH)硫醇类 G & L 95%-98% 85%-95%
Methanol(CH3OH)甲醇 G 99% 90%-95%
Nitric Acid(HNO3)硝酸 L 99% 98%-99%
Nitrogen Oxides(Nox)氮氧化物 G 30%-40% 20%-30%
Oil Mists 油雾 L & SL 95%-98% 85%-90%
Perchloric Acid 过氯酸 G 98%-99% 85%-95%
Phenol(C6H5OH)酚 G & L 95%-99% 80%-90%
Phosphate Salt Baths 磷酸盐 L 98%-99% 98%-99%
Phosphoric Acid(H3PO4) 磷酸 K 98%-99% 98%-99%
Silicon Tetrachloride(SiCl4) 四氯化矽 G 99% 85%-95%
Silicon Tetrafluorde(SiF4) 四氟化矽 G 99% 85%-95%
Sodium Chloride(NaCl)氯化钠 S & L 98%-99% 98%-99%
Sulfuric Acid(H2SO4)硫酸 L 98%-99% 98%-99%
1Sulfur Dioxide(So2)二氧化硫 G 85%-90% 65%-70%
Urea(H2NCONH2)尿素 S & SS 98%-99% 85%-90%
1Hydrogen Sulfide(H2S)硫化氢 G 98%-99% 85%-95%

Note A:
1.须以NaOH溶液做洗涤液
NaOH scrubbing may be required
2.可能需用H2SO4溶液做洗涤液
H2SO4 scrubbing may be required
3.须特别配制的洗涤液
Special scrubbing may be required
4.上表未列的污染物处理请与本公司洽询
Consult KMC if effciencies other than shown are required or for contaminants not shown.

Note B:
G = 气体 Gas
L = 粒径大于3微米的液滴
L = liquid particulate above 3 microns
SL = 粒径小于3微米的液滴
SL = liquid particulate below 3 microns
S = 粒径大于3微米的固体微粒
S = Solid particulate above 3 microns
SS = 粒径小于3微米的固体微粒
SS = Solid particulate below 3 microns

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