一. 构造与原理:
1.当欲处理之气体进入塔内时,由于填充物(拉西环),造成的面积相当大,经循环泵浦由喷嘴所洒下之液体,与填充物充份雾化并和废气行气液雾化逆流之充分洗涤。填充塔内之除水层,所填充之滤料能将气流带出之水滴去除,再将气体排入大气中。
二. 配套设备:
1.加药机:以ph meter为sensor自动加药,随调整水洗塔内部水质。
2.废水处理池:水洗塔内溢流出的水因与酸碱及其它成份之气体接触,故排放前须先进入废水池处理才能合于标准(曝气、沈降、加药)
三. 用途:
1. 适用于印刷电路板工厂、电镀厂、化工厂、钢铁厂、金属表面处理业、……等废气之处理。污染源为HCL,HF,SO ,NO ,NH ,CrO ,HCHO,HCN,H S,PCL ,H SO ,Br ,(CH ) N,CL 等特定化学物质之废气处理。
备注:
废气中若有粉尘或黏滞性物质一并吸入时,须先过滤后才能将气体导入水洗塔内,否则将较易造成水洗设备的喷嘴阻塞。
污染物 Contaminants |
污染物状态 Type |
Yuh Cherng %efficiency |
Yuh Cherng %efficiency |
Acetic Acid(CH3O2H)乙酸 |
G & L |
98%-99% |
85%-95% |
Acetone(CH3HCH3)丙酮 |
G |
98%-99% |
85%-95% |
Aluminum Bright Dip 铝烟 |
G & L |
40%-98% |
30%-90% |
Aluminum Chlorde(AlCl3)氯化铝 |
S |
99% |
90%-95% |
2Amines(RNH2)有机氧 |
G |
98%-99% |
85%-95% |
2Ammonia(NH3)氨氧 |
G |
97%-99% |
80%-95% |
Ammonium Hydroxide(NH4OH)氨水 |
L |
97%-99% |
80%-95% |
Ammonium Nitrate(NH4NO3)硝酸铵 |
S & SS |
98%-99% |
85%-95% |
Anodizing Solutions 电镀液 |
L |
99% |
98%-99% |
Boric Acid(H3BO3)硼酸 |
L |
95%-98% |
80%-90% |
1Bromine(Br2)溴 |
G |
99% |
90%-95% |
1Carbon Dioxide(CO2)二氧化碳 |
G |
70%-85% |
40%-50% |
Caustic(NaOH)氢氧化钠 |
L |
99% |
98%-99% |
1Chlorine(Cl2)氯 |
G |
99% |
90%-95% |
Chlorosulfonic Acid(ClSO2OH)氯磺酸 |
S |
99% |
90%-95% |
3Chlorine Dioxide(ClO2)二氧化氯 |
G |
95%-98% |
85%-95% |
Chromic Acid(H2CrO4)铬酸 |
L |
99% |
97%-99% |
Citric Acid 柠檬酸 |
L |
98%-99% |
85%-95% |
Cyanide Salts |
L |
99% |
98%-99% |
Ethanol(CH3CH2OH)乙醇 |
G & L |
99% |
90%-95% |
1Formaldehyde(HCHO)甲醛 |
G & L |
98%-99% |
85%-95% |
Formic Acid(HCO2H)甲酸 |
G |
98%-99% |
85%-95% |
Hydrobromic Acid(Hbr)溴化氢 |
G & L |
98%-99% |
85%-95% |
Hydrochloric Acid(Hcl)盐酸 |
G,L & SL |
98%-99% |
85%-95% |
2Hydrofluoric Acid(HF)氟化氢 |
G |
99% |
90%-95% |
Hydrogen Cyanide(HCN)氰气(酸) |
G |
99% |
90%-95% |
3Mercaptans(RSH)硫醇类 |
G & L |
95%-98% |
85%-95% |
Methanol(CH3OH)甲醇 |
G |
99% |
90%-95% |
Nitric Acid(HNO3)硝酸 |
L |
99% |
98%-99% |
Nitrogen Oxides(Nox)氮氧化物 |
G |
30%-40% |
20%-30% |
Oil Mists 油雾 |
L & SL |
95%-98% |
85%-90% |
Perchloric Acid 过氯酸 |
G |
98%-99% |
85%-95% |
Phenol(C6H5OH)酚 |
G & L |
95%-99% |
80%-90% |
Phosphate Salt Baths 磷酸盐 |
L |
98%-99% |
98%-99% |
Phosphoric Acid(H3PO4) 磷酸 |
K |
98%-99% |
98%-99% |
Silicon Tetrachloride(SiCl4) 四氯化矽 |
G |
99% |
85%-95% |
Silicon Tetrafluorde(SiF4) 四氟化矽 |
G |
99% |
85%-95% |
Sodium Chloride(NaCl)氯化钠 |
S & L |
98%-99% |
98%-99% |
Sulfuric Acid(H2SO4)硫酸 |
L |
98%-99% |
98%-99% |
1Sulfur Dioxide(So2)二氧化硫 |
G |
85%-90% |
65%-70% |
Urea(H2NCONH2)尿素 |
S & SS |
98%-99% |
85%-90% |
1Hydrogen Sulfide(H2S)硫化氢 |
G |
98%-99% |
85%-95% |
Note A:
1.须以NaOH溶液做洗涤液
NaOH scrubbing may be required
2.可能需用H
2SO
4溶液做洗涤液
H
2SO
4 scrubbing may be required
3.须特别配制的洗涤液
Special scrubbing may be required
4.上表未列的污染物处理请与本公司洽询
Consult KMC if effciencies other than shown are required or for contaminants not shown.
Note B:
G = 气体 Gas
L = 粒径大于3微米的液滴
L = liquid particulate above 3 microns
SL = 粒径小于3微米的液滴
SL = liquid particulate below 3 microns
S = 粒径大于3微米的固体微粒
S = Solid particulate above 3 microns
SS = 粒径小于3微米的固体微粒
SS = Solid particulate below 3 microns